Application of Solid Immersion Lens to Submicron Resolution Imaging of Nano-Scale Quantum Wells*

Motoyoshi BABA; Masahiro YOSHITA; Takeaki SASAKI; Hidefumi AKIYAMA

doi:10.1007/s10043-999-0257-3

Motoyoshi BABA, Masahiro YOSHITA, Takeaki SASAKI, Hidefumi AKIYAMA

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Keywords: solid immersion lens, submicron resolution imaging, nano-scale quantum wells, near-field optics, spherical aberration, spatial resolution

JOURNAL FREE ACCESS

1999 Volume 6 Issue 3 Pages 257-260

DOI https://doi.org/10.1007/s10043-999-0257-3

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Abstract

We have discussed the resolution of submicron photoluminescence (PL) imaging using a solid immersion lens (SIL), which collects an evanescent light field. We apply the SIL microscope to measure PL image of a strip-line-patterned GaAs quantum well structure at low temperature. An improved resolution beyond diffraction limit and high collection efficiency of PL are realized.

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