Development of three-dimensional nanotechnology using focused ion beam

Abstract

Three-dimensional (3D) nanostructure fabrication using focused ion beam chemical vapor deposition (FIB-CVD) has the following advantages.　(1) Because the beam diameter of FIB is 5 nm, 3D nanostructures with a few ten nanometers can be fabricated using FIB.　(2) 3D nanostrucures made of metal, semiconductor, and insulator can be fabricated using various source gases.　Three-dimensional nanotechnology using FIB can be widely applied to electronics, mechanics, optics, and biology.　We have demonstrated the fabrication of free-space nanowiring, electrostatic nanoactuator, bioinjector, and electrostatic nanomanipulator using FIB.