2005 Volume 74 Issue 4 Pages 501-505
The progress of microfabrication technology has been significant in recent years. We can fabricate nanostructure patterns with 100 nm and 10 nm dimensions using photolithography and electron-beam-lithography, respectively. However, these exposure machines are very expensive, over 1 million dollars, and can only be applied to the mass production of Si devices. On the other hand, nanoimprints with a 10 nm resolution can be fabricated at a very low cost and achieve a high throughput. This technology is very useful for fabricating biodevices. This article describes nanoimprint processes and their application to biodevices.
