Present status and future trend of Cat-CVD technology

Abstract

The deposition mechanism and features of catalytic chemical vapor deposition (Cat-CVD) method are briefly summarized, along with typical properties of films deposited by this method. The application of high-density hydrogen atoms, generated in the Cat-CVD apparatus, is also introduced, together with various applications of the deposited films themselves. It is demonstrated that the application of Cat-CVD technology is expanding to various devices and that it is expected as a fundamental tool for various industrial fields.