Mechanical properties of ZrO₂, HrO₂, Al₂O₃ and Y₂O₃ thin films synthesized by CVD technique operated under atmospheric pressure.

Abstract

Mechanical properties of ZrO₂, HfO₂, Al₂O₃ and Y₂O₃ thin films synthesized using a chemical vapor deposition technique operated under atmospheric pressure were investigated. X-ray diffraction reveals the existence of tetragonal, monoclinic, amorphous and cubic structure for zirconia, hafnia, alumina and yttria respectively. The nanoindentation test points out that the films of zirconia possess the highest values of elastic modulus and hardness. Elastic modulus and hardness of the hafnia films are in a good agreement with those in the reference (Ceramics fundamentals, M. Barsoum).