Effects of imposition of magnetic field on thermal CVD process

Noboru Yoshikawa; Takanori Endo; Shoji Taniguchi; Satoshi Awaji; Kazuo Watanabe

doi:10.14853/pcersj.2002F.0.82.0

15th Fall Meeting of The Ceramic Society of Japan

DOI https://doi.org/10.14853/pcersj.2002F.0.82.0

Conference information

Host: The Ceramic Society of Japan

Effects of imposition of magnetic field on thermal CVD process

Noboru Yoshikawa, Takanori Endo, Shoji Taniguchi, Satoshi Awaji, Kazuo Watanabe

Author information

Keywords: Chemical vapor deposition, Magnetic field, Vaporized precursor amount, Crystal orientation, Crystal morphology, Grain structure

CONFERENCE PROCEEDINGS FREE ACCESS

Pages 82

Details

Abstract

Thermally-activated Chemical Vapor Deposition (CVD) process was performed with imposition of magnetic field up to 5T (tesla) and iron crystals were deposited. Influence of the magnetic field on the deposition kinetics, the crystal morphologies and the orientations was investigated. Consumption of FeCl₃ increased as the increase of the magnetic field strength. The magnetic field influenced the shape and the orientation of the island-shaped crystals, markedly, however, the influence on the morphology and the crystal orientation was not observed in the film-state crystals.

Corresponding author

Register with J-STAGE for free!