Abstract
We have succeeded in preparing YSZ films at high deposition rate of 660μm/h using newly developed laser MOCVD. In this study, effects of incident laser power (PL) and substrate pre-heating temperature (Tpre) on deposition rates and microstructures were investigated. When PL=200 W, YSZ films with a columnar structure were prepared at PL from no pre-heating to 750°C. The deposition rate at PL=200 W and PL=550°C was 450μm/h and the YSZ film had a highly (200) oriented columnar structure.