Abstract
We have successfully synthesized highly ordered hexagonal mesoporous SiO2 thin films by a surfactant-templating method. By aging as-deposited films at various conditions we can easily tailor the pore size and porosity. The pore channel structure in the film is thermal stable until 900 oC and orient parallel to the substrate. We attempted to pattern the synthesized highly ordered hexagonal silica in various size (micrometer to millimeter) and thickness (nanometer to micrometer). The characterization of the patterned hexagonal mesoporous silica will be discussed.
