Abstract
A novel self-assembly approach based on a gas-generated reaction was developed for patterning of zirconia thin film from an aqueous peroxozironium-complex solution. This solution was obtained by dissolving zirconium nitrate into a mixture solvent of ammonia and hydrogen peroxide aqueous solution. A zirconia precursor pattern was obtained at room temperature using a modified self-assembled monolayer as a template. Gas generated during reaction selectively adsorbed to the hydrophobic region, preventing the deposition of zirconia in these regions. Deposits were only observed in hydrophilic areas.
