Molecular design in obtaining crack-free amorphous alumna films

Hidetoshi Saitoh; Dieudonne Epassaka; Noriko Ito; Kei-ichi Namiki; Shigeo Ohshio

doi:10.14853/pcersj.2004S.0.179.0

Preprints of Annual Meeting of The Ceramic Society of Japan, 2004

Session ID : 1I08

DOI https://doi.org/10.14853/pcersj.2004S.0.179.0

Conference information

Host: The Ceramic Society of Japan

Molecular design in obtaining crack-free amorphous alumna films

*Hidetoshi Saitoh, Dieudonne Epassaka, Noriko Ito, Kei-ichi Namiki, Shigeo Ohshio

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Keywords: alumna, crack, CVD, amorphous, film

CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract

The amorphous alumna films deposited by the chemical-vapor deposition method produces microcracking on the surface at 300 ﾟC. To avoid formation of microcracking, molecular design of starting materials was conducted. Optimum starting material avoids microcracking of the films during the annealing treatment. No desorption of water was observed on crack-free film.

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