Microcracking of amorphous alumna films

Hidetoshi Saitoh; Dieudonne Epassaka; Noriko Ito; Kei-ichi Namiki; Shigeo Ohshio

doi:10.14853/pcersj.2004S.0.178.0

Preprints of Annual Meeting of The Ceramic Society of Japan
Preprints of Fall Meeting of The Ceramic Society of Japan

Preprints of Annual Meeting of The Ceramic Society of Japan, 2004

Session ID : 1I07

DOI https://doi.org/10.14853/pcersj.2004S.0.178.0

Conference information

Host: The Ceramic Society of Japan

Microcracking of amorphous alumna films

*Hidetoshi Saitoh, Dieudonne Epassaka, Noriko Ito, Kei-ichi Namiki, Shigeo Ohshio

Author information

Keywords: alumna, crack, CVD, amorphous, film

CONFERENCE PROCEEDINGS FREE ACCESS

Details

Abstract

The amorphous alumna films deposited by the chemical-vapor depositionmethod were annealed at 600 ﾟC. After anneal treatment, microcracking was recognized on the surface of the films. The microcracking occurred at 300 ﾟC. In addition, desorption of water was observed at 300 ﾟC and higher. The microcraking occurs by the volume reduction of the film with desorption of water.

Content from these authors

Favorites & Alerts

Corresponding author

Register with J-STAGE for free!