Abstract
Aerosol deposition (AD) is a novel ceramic coating method using room temperature impact consolidation (RTIC) phenomena for ceramic fine powder. This method has a wide range potential for fabrication of integrated micro devices and novel nano composite materials. This report reviewed the development of dielectric layers fabricated by AD method at first. BaTiO3 and BaSrTiO3 system thin and thick films were successfully fabricated on Cu substrates at room temperature by employing an AD method. Their dielectric permittivity and dielectric loss tangent were enhanced to approximately 90-120 and 1-1.5 % at 100 kHz, respectively. After annealing at 300C in air, their dielectric permittivity also increased up to approximately 200-300. Finally, we could obtain the capacitance density of 300 nF/cm2 for the ADM-derived BaTiO3 film. As-deposited BST (x=0.6) film at R.T. even showed a tunability of 15 %. At the BST(x=0.6) film annealed at more than 400C, a high tunability of 30% can be obtained at an applied electric field of 150 kV/cm. Embedded capacitors and RF filters were also fabricated.
