Host: The Ceramic Society of Japan
True density of amorphous carbon films deposited on the surface-plasmon-resonance (SPR) device was measured. An X-ray reflectivity analysis revealed that the density of the amorphous carbon films deposited by a radio frequency magnetron sputtering method and an electron cyclotron resonance plasma chemical vapor deposition method were 1.6 g/cm3 and 1.4 g/cm3, respectively. The SPR angle was shifted toward high value when the film density and the thickness increased.