Promotion of the Photocatalytic Activities of Layered Semiconductors by the Intercalation of Alkylamine

Peilin Zhang; Shu Yin; Tsugio Sato

doi:10.14853/pcersj.2008S.0.2J03.0

Annual Meeting of The Ceramic Society of Japan, 2008

Session ID : 2J03

DOI https://doi.org/10.14853/pcersj.2008S.0.2J03.0

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Host: The Ceramic Society of Japan

Promotion of the Photocatalytic Activities of Layered Semiconductors by the Intercalation of Alkylamine

*Peilin Zhang, Shu Yin, Tsugio Sato

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Keywords: photocatalyst, intercalation, NO, interlayer distance, alkylamine, layered semiconductor

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Abstract

The interlayer distances of layered semiconductors such as K₄Nb₆O₁₇, K₂Ti₄O₉ and KTiNbO₅ were enlarged by the ion exchange with H⁺ followed by the intercalation of alkylamine. EDX, CN analysis, XRD, TG-DTA, together with UV-vis measurement were carried out to characterize the prepared samples. The photocatalytic activities were evaluated by the photo-decomposition of NO. The results suggested that the enlargement of the interlayer distance was useful to promote the photocatalytic activities for the dustruction of NO.

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