Preface for Special Issue of Advanced Patterning Materials and Processes: Opportunities in Sub-10 nm Half Pitch Patterning and Beyond

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Preface for Special Issue of Advanced Patterning Materials and Processes: Opportunities in Sub-10 nm Half Pitch Patterning and Beyond

Tomoki Nagai, Takeo Watanabe

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Keywords: Sub-10 nm Half Pitch Patterning, 193i QP limitation, Lithography options, Driving force, Market demand

JOURNAL FREE ACCESS

2015 Volume 28 Issue 6 Pages 775

DOI https://doi.org/10.2494/photopolymer.28.775

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© 2015 The Society of Photopolymer Science and Technology (SPST)

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