Abstract
Phosphazene/SiO2 hybrid materials were prepared by reaction of a hydroxylic group-containing cyclophosphazene with tetraethoxysilane by the sol-gel process. The characteristics of the final products were studied by X-ray and TG-DTA analyses, and by IR spectroscopy. The data obtained suggest that a true chemical bond is formed between the SiO2 network and the phosphazene system.
