2002 JSPE Autumn Meeting
Session ID : I21
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Host: The Japan Society for Precision Engineering
Deposition of Silicon Nitride Film by Atmospheric Pressure Plasma CVD Method with Rotary Electrode -Optimization of NH3/SiH4 ratio-
Yuzo Mori, Kumayasu Yoshii, Kiyoshi Yasutake, Hiroaki Kakiuchi, Hiromasa Ohmi, Tatsushi Yamamoto, *Yasuji Nakahama
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