Proceedings of JSPE Semestrial Meeting
2003 JSPE Spring Meeting
Session ID : C38
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Host: The Japan Society of Precision Engineering

Research on Resist Exposure to a Short-Wavelength light Using Resist Patterns Formed by a Long-Wavelength light as Masking Patterns.
*Yoshitaka Suzuki, Takashi Shiomi, Toshiyuki Horiuchi
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Keywords: Optical Lithography, Two-Layer Resist, Double Exporuse
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[in Japanese]
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© 2003 The Japan Society for Precision Engineering
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