Proceedings of JSPE Semestrial Meeting
2003 JSPE Spring Meeting
Session ID : C51
Conference information

Host: The Japan Society of Precision Engineering

Deposition of Silicon Nitride Film by Atmospheric Pressure Plasma CVD-Effect of H2-
[in Japanese], [in Japanese], [in Japanese], [in Japanese], [in Japanese], *[in Japanese]
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Keywords: Atmospheric Pressure Plasma CVD, Silicon Nitride, SiH4, NH3, H2, Bond Density
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[in Japanese]
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© 2003 The Japan Society for Precision Engineering
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