2003 JSPE Spring Meeting
Session ID : C50
Conference information
Host: The Japan Society of Precision Engineering
Epitaxial Growth of Si by Atmospheric Pressure Plasma CVD (IV)
Yuzo Mori, Kumayasu Yoshii, Kiyoshi Yasutake, Hiroaki Kakiuchi, Hiromasa Ohmi, *Katsuo Wada
Author information
Keywords:
Atmospheric Plasma,
Plasma CVD,
Epitaxial Growth,
Silicon Wafer,
High-Rate Growth,
Rotary Electrode
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