Abstract
Recently, the stereolithography that is one of the Rapid Prototyping technologies has attracted more attention. In this study, we propose a novel stereolithography method, in which the evanescent wave with higher resolution is used as the exposure energy and aim at establishing the nano–stereolithography with higher accuracy and flexibility. We demonstrated the feasibility of lithography with the resolution of 100 nm scale by using evanescent wave in past reports. As the fifth report, we design and develop an experimental apparatus of nano–stereolithography, which has an imaging system of great precision. And we examine the fundamental function of the apparatus.
