Proceedings of JSPE Semestrial Meeting
2007 JSPE Spring Meeting
Session ID : C16
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Study on Copper-Chemical Mechanical Polishing with Fullerene Nano-Particles
*Hiroki Tanada, Takashi Miyoshi, Yasuhiro Takaya, Terutake Hayashi
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Keywords: CMP, fullerene
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[in Japanese]
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© 2007 The Japan Society for Precision Engineering
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