Abstract
It is well known that a sputtered metal film grows with inclined columns when the incident angle of sputtered particles to the substrate inclines. We have already shown that the novel structured film, such as zigzag and/or spiral columnar structure along with the growth direction, can be grown by changing the incident angle of sputtered particles during deposition. In this study, we have tried to fabricate the metal films with more complex nano-structure by using a vacuum stage capable of controlling its tilt and rotation during film growth.