Abstract
Localized surface Plasmon resonance (LSPR) is an optical absorbance phenomenon which is excited at sub-micro meter sized noble metal structure. In this study, we aimed at the fabrication of the nanostructure for excitation of LSPR by using electron beam lithography (EBL). For excitation of LSPR, a Line and space resist pattern which has a pitch of 400 nm was obtained by EBL. And then, Au layer (thickness:30 nm) was deposited onto the resist pattern. As a result, we could observe the LSPR absorbance peak at 510 nm. further more, the LSPR peak shift depending upon the Au thickness was observed.
