Proceedings of JSPE Semestrial Meeting
2011 JSPE Autumn Conference
Session ID : F64
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Study on Sapphire CMP slurries using fullerenol as fine particles
Investigation of polishing performance based colloidal silica slurry
*Takashi SaitoKeisuke SuzukiKhajornrungruang PanartErika KarasudaniKeiichi Kimura
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CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract
[in Japanese]
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© 2011 The Japan Society for Precision Engineering
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