2011 JSPE Autumn Conference
Session ID : I81
Conference information
Host: The Japan Society for Precision Engineering
Fabrication of damage-free curved silicon crystal substrate for a focusing X-ray spectrometer by Plasma Chemical Vaporization Machining (6th report)
Study on generation mechanism of surface roughness by gas fluid analysis
Keywords:
Doubly curved crystal,
Johansson type,
Atmospheric pressure plasma,
Plasma Chemical Vaporization Machining,
X-ray fluorescence analysis,
Focusing
Details
