Abstract
Grayscale laser beam lithography (G-LBL) is a low-cost and simple process for creating multi-tier and undulated surfaces by modulating the exposure dose during writing. In this study, a G-LBL technique was studied to be applied to fabricate multi-tier Si and quartz molds and a grey scale optical element. Based on the investigated relation among the relative laser exposure dose, the thicknesses and interference colours of residual resist layers, a structure for a grey scale optical element was fabricated in the resist on Si substrate. Additionally, multi-tier Si and quartz molds were fabricated by G-LBL followed by reactive ion etching (RIE). Finally, fabricated mold samples were used for UV imprint experiments to evaluate their feasibility as molds.
