Research on Mold Fabrication by Using Nanoscratching and Its Application

Abstract

The MEMS technology for various nano/micro devices often requires special facilities and multistage processes, thus the fabrication cost is extremely high. Therefore, alternative methods that are more concise, economic and precise patterns need to be developed. Nanoimprint lithography is one of the potential methods. This research aimed to fabricate nanoscale basic structures on silicon substrates using nanoscratching, which can be potentially used to make nano/micro molds for nanoimprint lithography. In this report, various nano/micro-scale structures, such as groove and layer structures were generated on the silicon substrate using an atomic force microscope equipped with a sharp monocrystalline diamond probe. The nanoimprint experiment was also performed using the fabricated single-layer mold to fabricate single island structure on silicon-resin.