2012 JSPE Spring Conference
Session ID : J19
Conference information
Host: The Japan Society for Precision Engineering
Study on phenomenon on polishing surface in Oxide-CMP applying Evanescent field
*Yoshikazu Idei, Keiichi Kimura, Panart Khajornrungruang, Keisuke Suzuki, Suguru Sakoda
Author information
Keywords:
Evanescent field,
Fine particle,
Oxide-CMP,
Material removal mechanism,
Colloidal Silica,
Ceria
Details
