Proceedings of JSPE Semestrial Meeting
2013 JSPE Autumn Conference
Session ID : E38
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Study on Some Factors that Affect the Improvement in Removal Rates by means of Ceria Dispersibility Control in Polishing Slurry for Glass Based Materials
*Yishen LuKensuke Tsuchiya
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Abstract
Improvement in Removal Rates and Possibility of reducing abrasive usage by controlling the dispersibility of polishing slurry for glass based materials was reported previously. In this research, some factors, such as abrasive particles size, abrasive concentrations, pad types, pre-polishing surface statuses of work pieces, were studied for their effects on improvement in removal rates.
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© 2013 The Japan Society for Precision Engineering
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