Development of high efficiency CMP technique for sapphire substrate using AC electric field

Abstract

Single crystal sapphire substrate for LED has a high hardness and high chemical stability. For this reason, a lot of time spent for polishing. The purpose of this study is introduced the loose abrasives controlled technique is applied AC electric field to CMP method. We obtain high efficiency and high quality CMP technique. In this report, we describe a novel CMP experimental under AC electric field.