Electrical Resistivity at the Interface between Glass and Abrasives During Chemical Mechanical Polishing

Abstract

Redox of Ce⁴⁺/Ce³⁺ would play a major role for softening glass surface. Oxidation-reduction potential of the redox reaction would be an index of chemical polishing, but there is few data that clarify electrical properties during polishing. We then investigate electrical conductivity at the interface of glass/abrasives during polishing. The conductivity was increased with increasing rotation rate and the polishing would increase concentration of electron or ions at the interface.