Proceedings of JSPE Semestrial Meeting
2014 JSPE Autumn Conference
Session ID : L03
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Host: The Japan Society for Precision Engineering

Development of low defect slurry for silicon wafer polishing
*Akiko Miyamoto, Tatsuya Nakauchi, Masashi Teramoto, Noriaki Sugita, Yoshiharu Ota, Takayuki Matsushita
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Keywords: CMP, slurry, polymer, polish, PID
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[in Japanese]
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© 2014 The Japan Society for Precision Engineering
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