Proceedings of JSPE Semestrial Meeting
2014 JSPE Spring Conference
Session ID : I25
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Host: The Japan Society for Precision Engineering

Study on Possible Mechanism of the Improvement in Removal Rates by means of Dispersibility Control in Ceria Abrasive Polishing Slurry
*Yishen Lu, Kensuke Tsuchiya
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Keywords: Abrasive Particle, Glass, Dispersibility, Ceria, Polishing Resistance
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[in Japanese]
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© 2014 The Japan Society for Precision Engineering
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