Fabrication and application of microstructure fabricated by Metal-assisted chemical etching of silicon using patterned silver nanoparticles

Abstract

Metal-assisted chemical etching (MacEtch) is one of the anisotropic etching processes which enables unique fabrication of high aspect-ratio structure by selective etching at the interface of noble metal catalyst. This study aims to fabricate silicon nano-pillars by MacEtch using densely deposited Ag nanoparticles on substrate. We made clear not only basic machining properties such as etching rate and attainable aspect-ratio but the effect on wettability. Furthermore, potential applicability to hydrophobic surface design was discussed.