Self-propagating exothermic reaction behavior of Ti-SiO_x multilayer films prepared by dual source sputtering

Abstract

We have been exploring a Ni-free material showing stable self-propagating reaction for medical use, and reported that Ti-Si multilayer films could be a promising candidate. However, the reaction of this material was found to be so sensitive that handling of the films was not easy. The purpose of this work is to control the reaction behavior of the multilayer films with using SiOx layer as an alternative of Si layer. The effects of Ti/SiOx thickness ratio, bilayer thickness and total thickness of Ti-SiOx multilayer films upon their reaction behavior were investigated.