Abstract
Pulsed laser deposition (PLD) is applied to formation of metallic nitride thin films for plasmonic waveguiding phenomena. Intense third harmonic pulses of Nd:YAG laser (355nm, 350mJ/pulse, 10Hz) are used. The PLD is well-known as (1)a clean deposition process, (2) a high deposition rate process, and (3) a stoichiometric deposition process. In this research, creation of sub-wavelength thin films of both titanium nitride (TiN) and aluminum nitride (AlN) have been studied deposited and their physicochemical attribute are analyzed by several spectroscopic techniques such as X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometry (SE), and UV/Vis-NIR spectrophotometry. Plasmonic property of the TiN film is try to be confirmed by formation of an asymmetric metal-insulator-metal (MIM) structure with the AlN thin film. Spectroscopic reflectance curve of the MIM structure will indicate possibility of TiN plasmonic waveguide. Also the corresponding electromagnetic calculation has been done by a numerical simulation software based on a finite element method (FEM).
