2017 JSPE Spring Conference
Session ID : G75
Conference information
Host: The Japan Society for Precision Engineering
Name : 2017 JSPE Spring Conference
Date : March 13, 2017 - March 15, 2017
Determination of polishing pad conditioning method based on relationship between polishing apparatus and various consumables at chemical mechanical polishing
*Takahiro Matsunaga, Michio Uneda, Kazutaka Shibuya, Yoshio Nakamura, Daizo Ichikawa, Ken-ichi Ishikawa
Author information
Keywords:
Chemical Mechanical Polishing,
Removal Rate,
Pad Surface Asperity,
Conditioning,
Machine learning
Details
