Development of high-efficient and damage-free ultrasonic assisted electrochemical mechanical polishing for difficult-to-machine materials

Effects of mass concentration of electrolyte (NaCl) on the anode oxidation rate and the promotion performance of ultrasonic vibration

Abstract

SiC is a kind of promising semiconductor material, but it is difficult to realize high-precision and highly efficient polishing of SiC, owing to its high hardness and high chemical inertness. To obtain atomically smooth surface with high efficiency, we proposed ultrasonic assisted electrochemical mechanical polishing (UAECMP). In this study, effects of application of ultrasonic vibration and mass concentration of the NaCl aqueous electrolyte on the anodic oxidation rate of SiC substrate were investigated.