Real Time Nanoscale Observation in Cleaning Phenomena by Evanescent Field

Report 6 : Suspended Particle Behavior in Shear Flow Field

Abstract

Preventing the reattachment of nano-particles on the substrate surface is indispensable in the wafer cleaning process. In this paper, transportability of different sized nano-particles were observed, in the shear flow occurring near the surface region that duplicated cleaning process in lab-scale, by using the evanescent field. Sub-100 nm particles affected less flow effect and smaller inertia were less likely to be transported. In case of low speeds of inertial flow, most sub-100 nm particles still remain near the surface.