抄録
The goals for an experiment on an APCVD BPSG (oxide) deposition process were to decrease the thickness variation and to increase the deposition rate, withoutdegration in film quality. An L18 Dynamic Parameter Design experiment was used to find the settings for seven variables which resulted in finding conditions which could improve the % standard deviation of the thickness by about 45% and increasing the deposition rate by about 40%. Output parameters not optimized inthis experiment, such as etch rate, stress and refractive index were also verified to have remained within the needed tolerances. Since this experiment developed processes which could be used for several "products" , it is consideredto be "Technology Development" .
