Abstract
The oligomerization of ethylene was carried out on PhSiH3-modified ZrO2 and TiO2. Upon silylation with PhSiH3, the activity in the activity oligomerization of ethylene were newly generated on ZrO2 and TiO2. The oligomers consisted of 1-hexene(66%) on ZrO2 at PhSiH3 coverage of 0.1 and the oligomers consisted of 1-butene(80%) on TiO2 at PhSiH3 coverage of 0.45. We examine the effect of PhSiH3 coverage and adsorption pressure on the selectivite formation of 1-butene or 1-hexene on PhSiH3-modified oxides.