光波干渉ジマによるメッキ皮膜の厚サ測定

抄録

There are several methods for the measurement of the thickness of electro-plated film on metals; e.g., microscopy, dropping method (jet method), magnetic method, electro-chemical method, X-ray method, high frequency eddy current method (skin effect), etc. The values measured by the above methods are not decisive, since each method has both merits and demerits.
Direct observation of the film with light-wave interference fringes was attempted to determine the distance between the both surfaces of plated and non-plated metal with wave-length and the number of fringes, using the interference microscope made by Olympus Optical Co., Ltd. partly improved to be applied for the measurement of electro-plating thickness.
As a result of series of tests, it was found that, by this method, the thickness of electroplated film could be acculately determined from 0.05 to 40μ.