金属表面技術
Online ISSN : 1884-3395
Print ISSN : 0026-0614
ISSN-L : 0026-0614
フッ素電極によるクロムメッキ液中のフッ化物およびケイフッ化物の挙動
低濃度クロム酸溶液からのクロムメッキに関する研究 (第5報)
小西 三郎只腰 光章久保田 保隆
著者情報
ジャーナル フリー

1973 年 24 巻 3 号 p. 132-138

詳細
抄録
Activities of fluoride and foluorosilicate in chromium plating baths were studied by using a fluoride electrode, and the following results were obtained.
(1) In chromium plating baths, the activity of fluoride was less than that of the additional fluoride. The reason for this was that F-+H+→HF.
(2) The activity of fluoride well corresponded with the value calculated from pH of the plating bath and ionization constant of HF, 7.2×10-4.
(3) The activity of fluorosilicate was quite the same as that of fluoride at concentrations of less than 10-3mol/l or at higher pH. The reason was that the fluorosilicate was completely decomposed at low concentrations, and it was decomposed to fluoride at higher pH as follows:
SiF62-+6OH-→6F-+[Si(OH)6]2-
(4) The difference between activities of fluoride and fluorosilicate under other conditions was due to the formation of complex salt by fluorosilicate.
著者関連情報
© (社)表面技術協会
次の記事
feedback
Top