Titanium films of 0.5-10μm in thickness were ion-plated on mild steel substrates under various plating conditions using a diode system with electron beam-heated source materials. The surface morphology, hardness and porosity of the coatings were examined as functions of argon pressure (2×10-5-1×10-2 Torr) and of negative bias voltage to the substrate (0- -4kV). The low pressure process below 2×10-4 Torr provided the coatings with good properties, that is, the fine, dense structure, the improvement of brightness, and a decrease in porosity. The use of higher bias voltages resulted in a decrease in porosity and the grain refinement of the coatings. The corrosion potential of the titanium coatings above 2.5μm in thickness was almost the same with that of pure titanium sheet in 3% NaCl aqueous solution, and thus the satisfactory corrosion resistance was confirmed. The ion-plated titanium coatings showed far more excellent adhesion to the steel substrates than the coatings obtained by conventional vacuum vapor deposition.