金属表面技術
Online ISSN : 1884-3395
Print ISSN : 0026-0614
ISSN-L : 0026-0614
クロムめっきのハルセル試験における電位および電流分布の測定
井川 進内甑 安男井上 徹
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1979 年 30 巻 1 号 p. 22-26

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Potential and current distributions on the cathode panel of the Hull cell have been measured, using a chromium plating solution, with reference to the surface states of the cathode. In common Hull cell tests, several current waves which appear in I-E curves are represented on the single panel of the cell, and thus the actual current distribution differs from the primary one. In the case that chromium metal is deposited over the almost entire surface of the Hull cell panel (more than 8cm from the high current density edge), the current distribution (i) can be approximately shown by the following equation:
i=5(5.8-4.7log10x)1≤x≤8
where x is the distance from the high current density edge.
In the complicated film deposited from the plating bath with an addition of less than 3g/l Na2SiF6, a gray film portion through which current can pass more easily than through other parts and the potential of which is more noble than those of the both ends, has been recognized.
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© (社)表面技術協会
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