Abstract
Titanium nitride films of 2.4-2.7μm thickness were deposited on SUS 304 substrates by RF ion plating, and the effects of RF power (200-600W) and bias voltage (0- -300V) on their composition, surface morphology, spectral reflectance and knoop hardness were studied. Increases in RF power and bias voltage both exerted similar effects on film properties, producing lower oxygen content, smoother surface morphology, and greater spectral reflectance and hardness. These effects are explained in terms of an increase in the ions reaching the substrate.
