Journal of The Surface Finishing Society of Japan
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
ZnS: TbFx Thin Film EL Property Dependence on Sputtering Conditions
Saburou KUWANOYoshinori ITOH
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1998 Volume 49 Issue 2 Pages 180-184

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Abstract
We studied the relationship between the properties and brightness of ZnS: TbFx phosphor films synthesized under different sputtering conditions.
We clarified that the F/Tb ratio in films, ZnS (111) lattice plane distance (d), and the half width of the ZnS (111) peak profile (Δ2θ) markedly influenced emission brightness.
These properties were varied with sputtering conditions such as RF power, sputtering gas pressure, substrate and annealing temperatures.
We found the optimum conditions for synthesizing a brighter green ZnS: TbFx phosphor film to be 125W RF power, 1.33Pa sputtering gas pressure, 200°Csubstrate temperature and 300°Cannealing temperature.
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© The Surface Finishing Society of Japan
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