Mechanical Properties of Fluorocarbon Plasma Treated Silicon Containing Diamond Like Carbon Films

Abstract

Diamond like carbon (DLC) and silicon containing DLC (Si-DLC) films were deposited by EBEP (electron beam excited plasma)-CVD. The effects of CF₄ plasma treatment and Si-inclusion on DLC film on surface energy, nanoindentation hardness and nanoscratching properties were investigated. DLC and Si-DLC films were surface modified by CF₄ plasma treatment. CF₄ plasma treatment decreases surface energy evaluated by the liquid drop method. Si-inclusion decreases the nanoindentation hardness. CF₄ plasma treatment decreases nanoindentaion hardness of DLC film, however increases the hardness of 20% Si containing DLC film. Micro wear depth increases by Si-inclusion evaluated by nanoscratch test. CF₄ plasma treatment increases the micro wear of DLC film, however decreases the micro wear of 20% silicon containing DLC film. Friction coefficients of both DLC and Si-DLC films were decreased by CF₄ plasma treatment.