Transactions of the Society of Instrument and Control Engineers
Online ISSN : 1883-8189
Print ISSN : 0453-4654
Measurement
Simultaneous Measurement of Film Thickness and Surface Profile of Film-covered Objects by Monochromatic Light Interferometry
Hidemitsu OGAWAAkihiro NAKANOWATARIKatsuichi KITAGAWAMasashi SUGIYAMATakuto NAITO
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Volume 45 (2009) Issue 2 Pages 73-82

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Abstract

In semiconductor and LCD manufacturing processes, film thickness and surface profiles of film-covered objects need to be measured simultaneously. We extend phase-shifting interferometry and propose an algorithm named the SOR (Separation of Object and Reference beams) method that enables such simultaneous measurement. The SOR method can be applied not only to thick films but also to thin films, which is an advantage over existing methods. We apply the SOR method to silicon substrates covered with SiO2 films and demonstrate its usefulness.

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© 2009 The Society of Instrument and Control Engineers
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